Semiconductor device

ABSTRACT

The semiconductor device comprises a semiconductor chip defining a first face and a second face opposite to the first face, the semiconductor chip comprising at least one contact element on the first face of the semiconductor chip, an encapsulating body encapsulating the semiconductor chip, the encapsulating body having a first face and a second face opposite to the first face, a redistribution layer extending over the semiconductor chip and the first face of the encapsulating body and containing a metallization layer comprising contact areas connected with the contact elements of the semiconductor chip, and an array of external contact elements located on the second phase of the encapsulating body.

BACKGROUND OF THE INVENTION

The present invention relates to a semiconductor device and a method ofmanufacturing a semiconductor device.

Semiconductor chips comprise contact pads or contact elements. In asemiconductor chip package the semiconductor chip is embedded or housedwithin the chip package and the contact pads of the semiconductor chipare connected to external contact elements of the chip package.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide a furtherunderstanding of embodiments and are incorporated in and constitute apart of this specification. The drawings illustrate embodiments andtogether with the description serve to explain principles ofembodiments. Other embodiments and many of the intended advantages ofembodiments will be readily appreciated as they become better understoodby reference to the following detailed description. The elements of thedrawings are not to scale or not necessarily to scale relative to eachother. Like reference numerals designate corresponding similar parts.

Aspects of the invention are made more evident in the following detaileddescription of embodiments when read in conjunction with the attacheddrawing figures, wherein:

FIG. 1 shows a schematic cross-section representation of a semiconductordevice according to an embodiment;

FIG. 2 shows a schematic cross-section representation of an embodimentof a semiconductor device comprising a swellable sensor layer;

FIG. 3 shows a schematic cross-section representation of an embodimentof a semiconductor device comprising an absorbing sensor layer;

FIG. 4 shows a schematic cross-section representation of an embodimentof a semiconductor device comprising a color sensitive layer;

FIG. 5 shows a schematic cross-section representation of an embodimentof a semiconductor device comprising a polymer layer;

FIG. 6 shows a schematic cross-section representation an embodiment of asemiconductor device comprising a pressure-sensitive polymer layer;

FIG. 7 shows a schematic cross-section representation of an embodimentof semiconductor device comprising a sensor with a deformable layer;

FIG. 8A shows a schematic cross-section representation of an embodimentof a semiconductor device comprising a sensor with a deformable layer;

FIG. 8B shows a schematic representation of a top view of a completedevice structure containing embodiments of FIG. 8A.

FIG. 9A shows a schematic cross-section representation of an embodimentof a semiconductor device comprising a surface acoustic wave filter;

FIG. 9B shows a schematic representation of a perspective view of thefilter layer used in the embodiment of FIG. 9A.

FIG. 10 shows a schematic cross-section representation of asemiconductor device according to an embodiment;

FIG. 11 shows a flow diagram of a method of manufacturing asemiconductor device according to an embodiment; and

FIGS. 12A-F show schematic cross-section representations of products forillustrating an embodiment of the method of fabricating a semiconductordevice.

DETAILED DESCRIPTION OF THE INVENTION

In the following detailed description, reference is made to theaccompanying drawings, which form a part hereof, and in which is shownby way of illustration specific embodiments. In this regard, directionalterminology, such as “top”, “bottom”, “front”, “back”, “leading”,“trailing”, etc., is used with reference to the orientation of thefigure(s) being described. Because components of embodiments can bepositioned in a number of different orientations, the directionalterminology is used for purposes of illustration and is in no waylimiting. It is to be understood that structural changes may be madewithin the specific embodiment.

The aspects and embodiments are described with reference to thedrawings, wherein like reference numerals are generally utilized torefer to like elements throughout. In the following description, forpurposes of explanation, numerous specific details are set forth inorder to provide a thorough understanding of one or more aspects of theembodiments. It may be evident, however, to one skilled in the art thatone or more aspects of the embodiments may be practiced with a lesserdegree of the specific details. In other instances, known structures andelements are shown in schematic form in order to facilitate describingone or more aspects of the embodiments. It is to be understood thatother embodiments may be utilized and structural or logical changes maybe made without departing from the scope of the present invention.

In addition, while a particular feature or aspect of an embodiment maybe disclosed with respect to only one of several implementations, suchfeature or aspect may be combined with one or more other features oraspects of the other implementations as may be desired and advantageousfor any given or particular application. Furthermore, to the extent thatthe terms “include”, “have”, “with” or other variants thereof are usedin either the detailed description or the claims, such terms areintended to be inclusive in a manner similar to the term “comprise”. Theterms “coupled” and “connected”, along with derivatives may be used. Itshould be understood that these terms may be used to indicate that twoelements co-operate or interact with each other regardless whether theyare in direct physical or electrical contact, or they are not in directcontact with each other. Also, the term “exemplary” is merely meant asan example, rather than the best or optimal. The following detaileddescription, therefore, is not to be taken in a limiting sense, and thescope of the present invention is defined by the appended claims.

The embodiments of a semiconductor chip package and a method offabricating a semiconductor chip package each comprise at least onesemiconductor chip. The semiconductor chips described herein may be ofdifferent types, may be manufactured by different technologies and mayinclude for example integrated electrical, electro-optical orelectro-mechanical circuits and/or passives. The semiconductor chipsmay, for example, be configured as MOSFETs (Metal Oxide SemiconductorField Effect Transistors), IGBTs (Insulated Gate Bipolar Transistors),JFETs (Junction Gate Field Effect Transistors), bipolar transistors ordiodes. Furthermore, the semiconductor wafers and chips may includecontrol circuits, microprocessors or microelectromechanical components.In particular, semiconductor chips having a vertical structure may beinvolved, that is to say that the semiconductor chips may be fabricatedin such a way that electric currents can flow in a directionperpendicular to the main surfaces of the semiconductor chips. Asemiconductor chip having a vertical structure may have contact elementsin particular on its two main surfaces, that is to say on its front sideand backside. By way of example, the source electrode and gate electrodeof a power MOSFET may be situated on one main surface, while the drainelectrode of the power MOSFET may be arranged on the other main surface.Furthermore, the devices described below may include integrated circuitsto control the integrated circuits of other semiconductor chips, forexample the integrated circuits of power semiconductor chips. Thesemi-conductor chips described herein may be manufactured from anyspecific semiconductor material, for example Si, SiC, SiGe, GaAs, etc.,and, furthermore, may contain inorganic and/or organic materials thatare not semiconductors, such as for example insulators, plastics ormetals.

In several embodiments layers or layer stacks are applied to one anotheror materials are applied or deposited onto layers. It should beappreciated that any such terms as “applied” or “deposited” are meant tocover literally all kinds and techniques of applying layer onto eachother. In particular, they are meant to cover techniques in which layersare applied at once as a whole, like, for example, laminatingtechniques, as well as techniques in which layers are deposited in asequential manner, like, for example, sputtering, plating, molding,chemical vapor deposition (CVD) and so on. One example for a layer to beapplied is the so-called redistribution layer (RDL). The redistributionlayer can be in the form of a multi-layer, in particular a multi-layercomprising a repeating layer sequence. The redistribution layer can alsobe in the form of a metallization layer comprising one or more planes inwhich metallic or electrically conductive contact areas are provided.

Furthermore, the semiconductor chips described below may comprisecontact elements or contact pads on one or more of their outer surfaceswherein the contact elements serve for electrically contacting thesemiconductor chips. The contact elements may have the form of lands,i.e. flat contact layers on an outer surface of the semiconductor chip.The metal layer(s) of which the contact elements are made may bemanufactured with any desired material composition. Any desired metal ormetal alloy, for example aluminum, titanium, gold, silver, copper,palladium, platinum, nickel, chromium or nickel vanadium, may be used asa layer material. The metal layer(s) need not be homogenous ormanufactured from just one material, that is to say various compositionsand concentrations of the materials contained in the metal layer(s) arepossible. The contact elements may be situated on the active mainsurfaces of the semiconductor chips or on other surfaces of thesemiconductor chips.

The semiconductor chips may become covered with an encapsulatingmaterial. The encapsulating material can be any electrically insulatingmaterial like, for example, any kind of molding material, any kind ofepoxy material, or any kind of resin material. In the process ofcovering the semiconductor chips or dies with the encapsulatingmaterial, fan-out embedded dies can be fabricated. The fan-out embeddeddies can be arranged in an array having the form e.g. of a wafer andwill thus be called a “re-configured wafer” further below. However, itshould be appreciated that the fan-out embedded die array is not limitedto the form and shape of a wafer but can have any size and shape and anysuitable array of semiconductor chips embedded therein.

In the claims and in the following description different embodiments ofa method of fabricating a semi-conductor chip package are described as aparticular sequence of processes or measures, in particular in the flowdiagrams. It is to be noted that the embodiments should not be limitedto the particular sequence described. Particular ones or all of theprocesses or measures can also be conducted simultaneously or in anyother useful and appropriate sequence.

Referring to FIG. 1, there is shown a cross-sectional representation ofa semiconductor device according to an embodiment. The semiconductordevice 10 comprises a semi-conductor chip 1 defining a first face and asecond face opposite to the first face, the semiconductor chip 1comprising contact elements 1A located on the first face of the chip 1.The semiconductor device 10 further comprises an encapsulating body 2encapsulating the chip 1, the encapsulating body 2 having a first faceand a second face opposite to the first face. The semiconductor device10 further comprises a redistribution layer 3 extending over thesemiconductor chip 1 and the first face of the encapsulating body 2, theredistribution layer 3 containing a metallization layer comprisingcontact areas 3A connected with the contact elements 1A of thesemiconductor chip 1. The semiconductor device 10 further comprises anarray of external contact elements 4 located on the second face of theencapsulating body 2.

One of the advantages of the semiconductor device according to FIG. 1 isthe fact that the external contact elements 4 on the second face of theencapsulating body 2 may reduce the mechanical stress exposed on theexternal contact elements 4, when the semiconductor device is solderedto a printed circuit board (PCB) as the coefficient of thermal extension(CTE) of encapsulation material is usually in the same range as the CTEof the PCB. Moreover, with the external contact elements 4 on the secondface of the encapsulating body 2, the redistribution layer 3 on theother side of the semiconductor device 10 may be used to connectdifferent types of functional layers like sensors, polymer electronics,as will be explained and outlined along with further embodiments furtherbelow.

The semiconductor device can be fabricated by the extended wafer levelpackage technology as will be explained in detail further below. Asalready indicated above, this process technology includes producing are-configured wafer in which a plurality of semiconductor chips isembedded, the semiconductor chips having sufficient distance from eachother so that a fan-out of the electrical contacts of the semiconductorchips becomes possible. The extended wafer level package process alsoincludes the fabrication of the redistribution layer for spatiallyredistributing electrical contacts of the chip. Also enclosed within theextended wafer level package process can be the fabrication of afunctional layer over the redistribution layer which will also bedescribed in further detail below.

According to an embodiment of the semiconductor device as shown in FIG.1, the one or more contact elements 1A of the semiconductor chip 1 arelocated only on the first face of the chips. According to thisembodiment there are no contact elements located on the second face ofthe semiconductor chip.

According to an embodiment of the semiconductor device as shown in FIG.1, there can at least one further contact element be located on thefirst face of the semiconductor chips, the further contact element orelements not being connected with the contact areas 3A of themetallization layer and also not connected with the external contactelements 4. Instead the further contact element can, for example, beconnected with any sort of functional layer applied over themetallization layer.

According to an embodiment of the semiconductor device of FIG. 1, thesemiconductor chip 1 further comprises at least one of an integratedcircuit, a sensor, a transistor, a diode, and a passive electriccomponent.

According to an embodiment of the semiconductor device of FIG. 1, theexternal contact elements 4 are electrically coupled with the contactareas 3A of the metallization layer.

According to an embodiment of the semiconductor device of FIG. 1, theexternal contact elements 4 are electrically coupled with the at leastone contact element 3A of the semiconductor chip 1.

According to an embodiment of the semiconductor device of FIG. 1, theexternal contact elements 4 are comprised of solder elements like, forexample, solder balls or solder bumps.

According to an embodiment of the semiconductor device of FIG. 1, thesemiconductor device further comprises at least one through-connectextending through the encapsulating body 2, the through-connect couplingthe redistribution layer with one of the external contact elements 4.

According to an embodiment of the semiconductor device of FIG. 1, thesemiconductor device further comprises a sensor applied over theredistribution layer. According to a further embodiment thereof, thesensor can comprise one or more of a pressure sensor, a chemical sensor,a biological sensor, a gas sensor, and an acceleration sensor.

According to an embodiment of the semiconductor device of FIG. 1, thesemiconductor device further comprises a polymer layer applied over theredistribution layer, wherein the polymer layer may comprise at leastone active electronic device.

According to an embodiment of the semiconductor device of FIG. 1, thesemiconductor device further comprises a filter element applied to theredistribution layer 3. According to a further embodiment thereof, thefilter element comprises one or more of an optical filter, an acousticwave filter, an interference filter, and a Fabry-Perot filter.

According to an embodiment of the semiconductor device of FIG. 1, thesemiconductor device further comprises a mechanically deformable layerapplied over the redistribution layer 3. According to a furtherembodiment thereof, the mechanically deformable layer can be part of orbe integrated together with a sensor element applied over theredistribution layer 3.

According to the embodiment as depicted in FIG. 1, the semiconductorchip 1 is arranged horizontally within the semiconductor device 10 whichmeans that the first and second faces of the semiconductor chip 1 arearranged parallel to the main faces of the encapsulation layer 2 and theredistribution layer 3. However, it is also possible according to analternative embodiment that the semiconductor chip 1 is arrangedvertically within the semiconductor device 10 as will be shown furtherbelow in greater detail.

According to an embodiment of the semiconductor device of FIG. 1, thegeometrical dimensions of the layers can be within the following ranges.The semiconductor chip 1 can have a thickness in a range of 50 μm to 10mm, a width of 50 μm to 2 cm, and a length of 50 μm to 2 cm, and theredistribution layer 3 can have a thickness of 100 nm to 2 cm, and thefunctional layer can have a thickness of 10 nm to 2 cm.

Referring to FIG. 2, there is shown a cross-sectional representation ofa semiconductor device according to an embodiment. The semiconductordevice 20 comprises a semi-conductor chip 1, an encapsulating body 2, aredistribution layer 3, and external contact elements 4 such as thosedescribed in connection with the embodiment of FIG. 1. The semiconductordevice 20 further comprises a sensor element 25 applied over theredistribution layer 3. The sensor element 25 comprises a layer 25.1made of any sort of swellable material. The layer 25.1 is intended tochange its thickness when it gets in contact with any liquid or gaseousmaterial which is known to be absorbed by the material of layer 25.1.The layer 25.1 can, for example, comprise or consist of polyethylen.Such material is known to swell up under the influence of or theexposure to oil. Other materials for the layer 25.1 are also possible,in particular layers which are known to swell up under the exposure ofwater, alcohol, or gasses or liquids containing specifications. Thesensor 25 further comprises first capacitor electrodes 25.2 and a secondcapacitor electrode 25.3 and insulation layers 25.4 electricallyinsulating the capacitor electrodes 25.2 and 25.3 from the layer 25.1.The first capacitor electrodes 25.2 are electrically connected withcontact pads on the first face of the semiconductor chip 1. Thecapacitor electrodes 25.2 and 25.3 and the layer 25.1 in-between thecapacitor electrodes form a capacitor, the capacity of which isdetermined i.e. by the material and the thickness of the layer 25.1. Achange of one or more of the thickness and consistency of the layer 25.1due to the swelling or absorbing of any environmental liquid or gaseousmaterial will thus result in a change of the capacitance value of thecapacitor which can be sensed and, if appropriate, even evaluated by thesemiconductor chip 1.

Referring to FIG. 3, there is shown a cross-sectional representation ofa semiconductor device according to an embodiment. The semiconductordevice 30 comprises a semi-conductor chip 1, an encapsulating body 2, aredistribution layer 3, and external contact elements 4 such as thosedescribed in connection with the embodiment of FIG. 1. The semiconductordevice 30 further comprises a sensor 35, applied over the redistributionlayer 3. The sensor 35 comprises a layer 35.1 and electrodes 35.2. Thelayer 35.1 is comprised of a material which is known for changing itselectrical conductivity upon absorbing specified liquid or gaseousmaterials. The two electrode layers 35.2 are formed at an interfacebetween the redistribution layer 3 and the sensor layer 35.1. Theelectrode layers 35.2 are electrically connected with contact pads onthe first face of the semi-conductor chip 1. A change in the electricalconductivity of the layer 35.1 can, for example, be detected by applyinga voltage between the two electrode layer 35.2 and measuring the currentflowing from one electrode layer 35.2 to the other through the materialof the layer 35.1 in the semiconductor chip 1. The material of the layer35.1, for example, can be comprised of chelat complexes.

Referring to FIG. 4, there is shown a cross-sectional representation ofa semiconductor device according to an embodiment. The semiconductordevice 40 comprises a semi-conductor chip 1, an encapsulating body 2, aredistribution layer 3, and external contact elements 4 such as thosedescribed in connection with the embodiment of FIG. 1. The semiconductordevice 40 further comprises a sensor 45 for sensing liquid or gaseousmedia. The sensor 45 comprises a first optical filter layer 45.1 and asecond optical filter layer 45.2, both optical filter layers beingapplied on the redistribution layer 3. The first optical filter layer45.1 serves as a reference and comprises a material, the opticalproperties of which do not change in dependence on environmentalconditions. On the other hand the second optical filter 45.2 comprises amaterial which is known to change its optical properties, in particularits optical absorption at particular wavelengths due to the influence ofspecific gaseous or liquids to be detected. The first optical filterlayer 45.1 is connected with a first through-hole 45.3 which extendsfrom the first optical filter layer 45.1 through the redistributionlayer 3 to the first face of the semiconductor chip 1. A firstphotodiode 45.4 is located on the first face of the semiconductor chip 1aligned with the first through-hole 45.3. The second optical filterlayer 45.2 is connected with a second through-hole 45.5 which extendsfrom the second optical filter 45.2 through the redistribution layer 3to the first face of the semiconductor chip 1. A second photodiode 45.6is located on the first face of the semiconductor chip 1 aligned withthe second through-hole 45.5. The through-holes 45.3 and 45.5 are eitherempty or filled with an optically transparent material. The light whichis transmitted through optical filter layers 45.1 and 45.2 will bedetected by the photodiodes 45.4 and 45.6 and the signal outputs of thephotodiodes 45.4 and 45.6 can be used to derive therefrom a quantitywhich is a measure of the change of the optical properties of the secondoptical filter layer 45.2 and thus for the amount or strength of the gasor liquid to be detected therewith. As an alternative to the embodimentas shown in FIG. 4, it is also possible to use a single optical filterlayer and to measure only the change of optical properties of the singleoptical filter layer with a single photodiode on the semiconductor chip.As a further embodiment, the one or two optical filter layers applied onthe redistribution layer 3 can also be comprised of an interferencefilter or of a micro-mechanical tunable Fabry-Perot filter.

Referring to FIG. 5, there is shown a cross-sectional representation ofa semiconductor device according to an embodiment. The semiconductordevice 50 comprises a semi-conductor chip 1, an encapsulating body 2, aredistribution layer 3, and external contact elements 4 such as thosedescribed in connection with the embodiment of FIG. 1. The semiconductordevice 50 further comprises a polymer layer 51 applied onto theredistribution layer 3. The polymer layer 51 can comprise any type ofelectronic or opto-electronic components to fulfill different functions.The polymer layer 51, for example, can comprise OLED (Organic LightEmitting Diodes) devices or it can also comprise electronic componentslike, for example, transistors or diodes. It is also shown that thepolymer layer 51 is connected with the semiconductor chip 1 by twothrough-connects extending through the redistribution layer 3.

Referring to FIG. 6, there is shown a cross-sectional representation ofa semiconductor device according to an embodiment. The semiconductordevice 60 comprises a semi-conductor chip 1, an encapsulating body 2, aredistribution layer 3, and external contact elements 4 such as thosedescribed in connection with the embodiment of FIG. 1. The semiconductordevice 60 further comprises a polymer layer 61 which in this case servesthe purpose of a pressure sensor. Polymer materials are known to changetheir electrical conductivity upon exertion of pressure upon a surfacethereof. The polymer layer 61 can therefore simply be connected bythrough-connects extending through the redistribution layer 3 withcontact pads on the first face of the semiconductor chip 1. A voltagecan be applied by the semiconductor chip 1 between the two contactpoints of the through-connects with the polymer layer 1 and the currentflowing between the two contact points can be measured in dependence onthe pressure exerted onto the upper surface of the polymer layer 61.

Referring to FIG. 7, there is shown a cross-sectional representation ofa semiconductor device according to an embodiment. The semiconductordevice 70 comprises a semi-conductor chip 1, an encapsulating body 2, aredistribution layer 3, and external contact elements 4 such as thosedescribed in connection with the embodiment of FIG. 1. The semiconductordevice 70 further comprises a sensor 75 applied onto the redistributionlayer 3. The sensor 75 comprises a deformable layer 75.1 which, forexample, can be fabricated of silicone. The sensor 75 further comprisesfirst electrodes 75.2 and a second electrode 75.3. The first electrodes75.2 and the second electrode 75.3 form a capacitor, the capacitancevalue of which is determined i.e. by the thickness and the material ofthe deformable layer 75.1. The first electrodes 75.2 are connected withcontact pads of the semiconductor chip 1 by through-connects extendingthrough the redistribution layer 3. The change of the capacitance valueof the capacitor can be measured similar to the embodiment of FIG. 2,and the measured capacitance changes can be taken as a measure of theexternal force or pressure exerted on the deformable layer 75.1.

Referring to FIGS. 8A,B, there is shown a cross-sectional representationof a semiconductor device according to an embodiment (A). Thesemiconductor device 80 comprises a semiconductor chip 1, anencapsulating body 2, a redistribution layer 3, and external contactelements 4 such as those described in connection with the embodiment ofFIG. 1. The semiconductor device 80 further comprises a sensor 85 whichis a mechanical sensor intended to sense acceleration and vibrationmovements. The sensor 85 is similar to the sensor 75 of FIG. 7 and alsocomprises a deformable layer 85.1 and first and second electrodes onlower and upper surfaces of the deformable layer 85.1. In addition amass 85.4 is applied onto the upper electrode 85.3. Upon acceleration orvibration of an object like a vehicle, the mass 85.4 will be moved dueto its inert mass. The resultant deformation of the deformable layer85.1 can then be detected by the change of the capacitance value of thecapacitor. FIG. 8B shows a top view of a complete device structure whichshows that on a rectangular shaped deformable layer 85.1 four massbodies 85.4 may be attached near the four corners of the rectangularshaped deformable layer 85.1.

Referring to FIGS. 9A,B, there is shown a cross-sectional representationof a semiconductor device according to an embodiment (A). Thesemiconductor device 90 comprises a semiconductor chip 1, anencapsulating body 2, a redistribution layer 3, and external contactelements 4 such as those described in connection with the embodiment ofFIG. 1. The semiconductor device 90 further comprises a surface acousticwave (SAW) filter 95. The SAW filter 95 comprises a layer 95.1 which canbe made from materials like ZnO or AlN or any other piezo-electricalmaterial. The SAW filter 95 further comprises an electrode structuresuch as that shown in FIG. 9B. The electrode structure shown in FIG. 9Bis in principle known from SAW filters and will not be described indetail here. The electrodes applied onto the upper surface of the filterlayer 95.1 are electrically connected with contact pads on the firstface of the semiconductor chip 1 by respective through-connects throughthe redistribution layer 3 and the filter 95.1.

Referring to FIG. 10, there is shown there is shown a cross-sectionalrepresentation of a semiconductor device according to an embodiment. Thesemiconductor device 100 comprises a semiconductor chip 101 defining afirst face and a second face opposite to the first face, thesemiconductor chip 101 comprising contact elements 101A located on thefirst face of the chip 101 and contact elements 101B located on thesecond face of the chip 101. The semiconductor device 100 furthercomprises an encapsulating body 102 encapsulating the chip 101, theencapsulating body 102 having a first face and a second face opposite tothe first face. The semiconductor device 100 further comprises aredistribution layer 103 extending over the semiconductor chip 101 andthe first face of the encapsulating body 102, the redistribution layer103 containing a metallization layer comprising contact areas 103Aconnected with the contact elements 101A and 101B of the semiconductorchip 101. The semiconductor device 100 further comprises an array ofexternal contact elements 104 located on the second face of theencapsulating body 102. An essential feature of the semiconductor device100 of FIG. 10 is that the semiconductor chip 101 is oriented verticallywithin the semiconductor device 100, that means the first and secondfaces of the semiconductor chip 101 are oriented perpendicular to themain faces of the encapsulating layer 102 and the redistribution layer103 and side faces of the semiconductor chip 101 are oriented parallelto the main faces of the encapsulating layer 102 and the redistributionlayer 103. In fact in the embodiment as depicted in FIG. 10 thesemiconductor chip 101 rests with one of its side faces on an uppersurface of the redistribution layer 103. The contact elements 101A and101B of the semiconductor chip 101 are electrically connected to thecontact areas 103A by means of electrically conducting elements 105attached to the contact elements 101A and 102A on the first and secondfaces of the semiconductor chip 101. The electrically conductingelements 105 can be formed and arranged such that they also function assupport structures for the semiconductor chip 101 as the semiconductorchip 101 can be as thin as 50 μm so that the side face will have a widthof 50 μm accordingly and the support structures will help to enlarge thearea of the side face resting on the redistribution layer 103. Accordingto another embodiment the contact elements 101A, 101B can also bearranged on only one of the first and second surfaces of thesemiconductor chip 101 in which case the above mentioned supportstructures can still be arranged on both surfaces only one of which willbe needed then for electrically contacting the contact elements to thecontact areas of the redistribution layer.

Referring to FIG. 11, there is shown a flow diagram of a method ofmanufacturing a semiconductor device according to an embodiment. Themethod comprises placing multiple semi-conductor chips onto a carriereach of the semiconductor chips having a first face facing the carrierand a second face opposite to the first face (s1), applying anencapsulation material over the multiple semiconductor chips and thecarrier to form an encapsulating body having a first face facing thecarrier and a second face opposite to the first face (s2), applying aredistribution layer over the first faces of the multiple semiconductorchips and the first face of the encapsulating body (s3), and applying anarray of external contact elements to the second face of theencapsulating body (s4).

According to an embodiment of the method of FIG. 11, the method furthercomprises removing the encapsulating body from the carrier.

According to an embodiment of the method of FIG. 11, the method furthercomprises generating at least one through-connect extending through theencapsulating body. According to a further embodiment thereof,generating the at least one through-connect comprises generating atleast one through-hole through the encapsulating body and filling thethrough-hole with an electrically conducting material. According to afurther embodiment thereof, generating at least one through-holecomprises at least one of etching the at least one through-hole,drilling the at least one through hole, and laser etching the at leastone through-hole. According to a further embodiment, generating the atleast one through-connect comprises attaching metal bars to the carrierand afterwards applying the encapsulating material, so that the metalbars are embedded within the encapsulating layer, the metal bars havinga length so that they exceed through the encapsulating layer (ViaBars).The metal bars can be attached to the carrier in a pick-and-placeprocess, wherein essentially the same pick-and-place-equipment can beused as that used for placing the semiconductor chips and the placing ofthe metal bars can be done immediately before or after the placing ofthe semiconductor chips.

According to an embodiment of the method of FIG. 11, the method furthercomprises electrically coupling the redistribution layer with the atleast one contact element.

According to an embodiment of the method of FIG. 11, the method furthercomprises electrically coupling the external contact elements with thecontact areas of the metallization layer.

According to an embodiment of the method of FIG. 11, the method furthercomprises electrically coupling the external contact elements with theat least one contact element of the chip.

According to an embodiment of the method of FIG. 11, the method furthercomprises applying a sensor, in particular one or more of a pressuresensor, a chemical sensor, a biological sensor, a gas sensor, and anacceleration sensor, over the redistribution layer.

According to an embodiment of the method of FIG. 11, the method furthercomprises applying a polymer layer over the electrically conductivelayer, the polymer layer comprising at least one active electronicdevice.

According to an embodiment of the method of FIG. 11, the method furthercomprises applying a filter element, in particular one or more of anoptical filter, an acoustic wave filter, an interference filter and aFabry-Perot filter, to the redistribution layer.

According to an embodiment of the method of FIG. 11, the method furthercomprises applying a mechanically deformable layer to the redistributionlayer.

According to an embodiment of the method of FIG. 11, the method furthercomprises singulating the obtained structure into a plurality ofsemiconductor devices.

Referring to FIGS. 12A-F, there are shown cross-sectionalrepresentations of intermediate products for illustrating a method forfabricating a semiconductor device according to an embodiment.

As shown in FIG. 12A, semiconductor chips 1 are placed onto a carrier 5with a sufficient spacing from each other in order to allow fan-out ofthe electrical contact as will be seen later. A pick-and-place machinecan be used for placing the semiconductor chips 1 onto the carrier 5.The semiconductor chips 1 each comprise a plurality of electricalcontact elements 1A on a first main face. The carrier 5 can in principlebe made of any material and in most cases the carrier will be completelyremoved after applying of the encapsulating material and to apply aredistribution layer instead. However, it is also possible not to removethe carrier or to remove only a part of the carrier and to utilize theremaining portion of the carrier as part of the redistribution layer tobe fabricated. In this case the carrier itself or the part of thecarrier, which is intended to be left back, may be a dielectric orelectrically insulating layer.

In the following, a re-configured wafer is produced during applying ofan encapsulation layer 2 as shown in FIG. 12B. For example, a mold formcan be used which has the form of a wafer so that by this kind of wafermolding, for example, a 200 mm or 300 mm re-configured wafer isproduced.

Referring to FIG. 12C, in a first step of fabricating a redistributionlayer (RDL) the carrier 5 can be removed and a first insulating layer3.1 be applied instead. As was outlined above, the first insulatinglayer 3.1 can be part of the carrier 5 so that only the other part ofthe carrier 5 is removed or the first insulating layer 3.1 is identicalwith the carrier 5 so that the carrier 5 is in fact not removed bututilized to become part of the redistribution layer to be fabricated. Itis also possible that the carrier 5 is removed and no layer is activelyapplied to replace the carrier 5 wherein instead the last layer on thesurface of the semiconductor chip 1 and the contact elements 1A servesas the first insulating layer 3.1.

Afterwards electrical through-connects are formed into the firstinsulating layer 3.1, the through-connects being aligned with particularones of the electrical contact elements 1A. Afterwards electricalcontact areas 3A are formed on the surface of the first insulating layer3.1, the electrical contact areas 3A being connected with the throughconnects.

Referring to FIG. 12D, through-connects are formed into theencapsulating layer and the first insulation layer 3.1, thethrough-connects being aligned with the electrical contact areas 3A. Aswas outlined above, the through-connects through the encapsulating layer2 can also be fabricated in an earlier step by pick-and-place metal barsonto the carrier 5 and embedding them in the encapsulating material sothat later on only through-connects will have to be formed through thefirst insulation layer 3.1. Afterwards solder bumps are formed on thesurface of the encapsulating layer 2, the solder bumps beingelectrically connected to the through connects. For this purpose, it isalso possible to form a solder resist layer (not shown) onto the surfaceof the encapsulating layer 2, the solder resist layer having openingsaligned with the through-connects through the encapsulating layer 2.After applying the solder resist layer, the solder bumps can be formedinto the openings of the solder resist layer.

Referring to FIG. 12E, on the other side of the structure a secondinsulation layer 3.2 is formed onto the contact areas 3A and the firstinsulation layer 3.1 so that as a result the redistribution layer 3 isformed by the first insulation layer 3.1, the second insulation layer3.2 and the contact areas 3A embedded in between the first and secondinsulation layers 3.1 and 3.2. Afterwards through-connects are formedthrough the second insulation layer 3.2 and the first insulation layer3.1, the through-connects being aligned with remaining contact elements1A of the semiconductor chips 1.

Referring to FIG. 12F, a functional layer 7 is applied onto theredistribution layer 3, wherein the functional layer 7 can fulfill anyfunction which was described above in connection with the embodiments ofFIGS. 2 to 10, in particular anyone of the sensor or filter functions asdescribed therein. The function layer 7 comprises at least one contactelement 7A which is aligned with the through-connect formed into thefirst and second insulation layers 3.1 and 3.2 so that the functionallayer 7 can be electrically connected to the semiconductor chip 1. Atthe end, the obtained structure will be singulated into a plurality ofsemiconductor devices as indicated by the dashed line.

Although specific embodiments have been illustrated and describedherein, it will be appreciated by those of ordinary skill in the artthat a variety of alternate and/or equivalent implementations may besubstituted for the specific embodiments shown and described withoutdeparting from the scope of the present invention. This application isintended to cover any adaptations or variations of the specificembodiments discussed herein. Therefore, it is intended that thisinvention be limited only by the claims and the equivalents thereof.

1. A semiconductor device, comprising: a single semiconductor chipdefining a first face and a second face opposite to the first face, thesemiconductor chip comprising at least one contact element on the firstface of the semiconductor chip; an encapsulating body encapsulating thesemiconductor chip, the encapsulating body having a first face and asecond face opposite to the first face, the first face of theencapsulating body coplanar with the first face of the semiconductorchip, the second face of the encapsulating body spaced apart from thesecond face of the semiconductor chip such that the second face of thesemiconductor chip contacts the encapsulating body; a redistributionlayer extending over the semiconductor chip and the first face of theencapsulating body, and containing a metallization layer comprisingcontact areas, wherein at least one contact area is connected with atleast one contact element of the semiconductor chip; a functional layerdisposed on the redistribution layer, where at least one contact elementof the semiconductor chip is connected with the functional layer; and anarray of external contact elements located on the second face of theencapsulation body.
 2. The semiconductor device according to claim 1,wherein the contact elements of the semiconductor chip are located onlyon the first face of semiconductor chip.
 3. The semiconductor deviceaccording to claim 1, wherein the semiconductor chip further comprisesat least one of an integrated circuit, a sensor, a transistor, a diode,and a passive electrical component, electrically coupled with the atleast one contact element.
 4. The semiconductor device according toclaim 1, wherein the external contact elements are electrically coupledwith the contact areas of the metallization layer.
 5. The semiconductordevice according to claim 1, wherein the external contact elements areelectrically coupled with the at least one contact element of thesemiconductor chip.
 6. The semiconductor device according to claim 1,wherein the external contact elements comprise solder elements, inparticular solder balls or solder bumps.
 7. The semiconductor deviceaccording to claim 1, further comprising: at least one through-connectextending through the encapsulating body, the through-connect couplingthe metallization layer with one of the external contact elements. 8.The semiconductor device according to claim 1, further comprising: asensor applied over the metallization layer.
 9. The semiconductor deviceaccording to claim 8, wherein the sensor is one or more of a pressuresensor, a chemical sensor, a biological sensor, a gas sensor, and anacceleration sensor.
 10. The semiconductor device according to claim 1,further comprising: a polymer layer applied over the metallizationlayer, the polymer layer comprising at least one active electronicdevice.
 11. The semiconductor device according to claim 1, furthercomprising: a filter element applied to the metallization layer.
 12. Thesemiconductor device according to claim 11, wherein the filter elementcomprises one or more of an optical filter, an acoustic wave filter, aninterference filter, a Fabry-Perot filter.
 13. The semiconductor deviceaccording to claim 1, further comprising: a mechanically deformablelayer applied over the metallization layer.
 14. The semiconductor deviceaccording to claim 1, wherein: the semiconductor chip is orientedhorizontally within the semiconductor device.
 15. The semiconductordevice according to claim 1, wherein the semiconductor chip is orientedvertically within the semiconductor device.
 16. A semiconductor device,comprising: a single semiconductor chip comprising at least one contactelement on a main face thereof; an encapsulating layer encapsulating thesemiconductor chip, the encapsulating layer having a first face and asecond face opposite to the first face, the first face of theencapsulating layer coplanar with the main face of the semiconductorchip, the second face of the encapsulating layer spaced apart from aface of the semiconductor chip opposite the main face such that the faceof the semiconductor chip opposite the main face contacts theencapsulating layer; a redistribution layer extending over thesemiconductor chip and the first face of the encapsulating layer, andcontaining a metallization layer comprising contact areas, wherein atleast one contact area is connected with at least one contact element ofthe semiconductor chip; a functional layer disposed on theredistribution layer, where at least one contact element of thesemiconductor chip is connected with the functional layer; and an arrayof external contact elements located on the second face of theencapsulation layer.
 17. A semiconductor device, comprising: asemiconductor chip defining a first face and a second face opposite tothe first face, the semiconductor chip comprising at least one contactelement on the first face of the semiconductor chip; an encapsulatingbody encapsulating the semiconductor chip, the encapsulating body havinga first face coplanar with the first face of the semiconductor chip anda second face opposite to the first face, the encapsulating body indirect contact with and covering the entire second face of thesemiconductor chip; a redistribution layer extending over thesemiconductor chip and the first face of the encapsulating body, andcontaining a metallization layer comprising contact areas connected withthe contact elements of the semiconductor chip; a functional layer,other than a semiconductor chip, arranged above the redistributionlayer, wherein the functional layer comprises one or more of a sensor, afilter, a polymer layer comprising at least one active electronicdevice, and an optical device; and an array of external contact elementslocated on the second face of the encapsulation body.
 18. Asemiconductor device, comprising: a semiconductor chip comprising atleast one contact element on a main face thereof and having an opposingface; an encapsulating layer encapsulating the semiconductor chip, theencapsulating layer having a first face coplanar with the main face ofthe semiconductor chip and a second face opposite to the first face, theencapsulating layer in direct contact with and covering the opposingface of the semiconductor chip; a redistribution layer extending overthe semiconductor chip and the first face of the encapsulating layer,and containing a metallization layer comprising contact areas connectedwith the contact elements of the semiconductor chip; a functional layer,other than a semiconductor chip, disposed on the redistribution layer,wherein the functional layer comprises one or more of a sensor, afilter, a polymer layer comprising at least one active electronicdevice, and an optical device; and an array of external contact elementslocated on the second face of the encapsulation layer.